The development of a high precision ellipsometer for time-resolved studies of thin adsorbed films has been successful and of great importance to several specific projects. The instrument allows precise and rapid measurements of the ellipsometric angles Ψ and Δ, thus, allowing unique studies of the evolution of both the thickness and density (refractive index) of adsorbed surfactant and polymer layers with time. The possibility of working at different wavelengths provides an additional source of information on complex systems as well as flexibility to optimize the optical contrast of the systems studied. Continued efforts are invested in upgrading this instrument to improve its potential for studies of fast interfacial processes occurring on the nanometer scale. 

During 1998 we acquired an additional ellipsometer, an Optrel Multiskop (Optrel, Berlin Germany). This instrument has been fitted with sample cells to measure at the solid-liquid, liquid-liquid and liquid-air interfaces. Apart from doing null-ellipsometry we can also do imaging ellipsometry, Brewster Angle Microscopy, Surface plasmons as well as operate it in waveguide mode. (Sponsored by FRN). 

A spectroscopic ellipsometer, Horiba UVISEL-ER-AGAS Spectroscopic Ex-Situ Ellipsometer for the FUV-VIS-NIR Range with Automatic Goniometer and Motorised Mapping Stage that allow determination of the thin film properties within the spectral range from 190-2100 nm was purchased in 2010. The spectroscopic ellipsometer incorporates phase modulation technology to characterize polarization changes at high frequency (50 kHz), and without any mechanical movement. The Uvisel is equipped with a Multi Channel System for Parallel Spectra Acquisition for kinetic studies of thin films within the spectral range from 190 to 810 nm. The instrument is equiped with measuring cells for measurements at the solid-liquid and air-liquid interface under controlled conditions. (New instrument, sponsored by The Knut and Alice Wallenberg Foundation.)